Source Technology

Applications

• In 2013, AE^® disrupted the dual-magnetron sputtering paradigm by introducing bipolar pulsed-DC technology, providing unprecedented plasma control where only limited control previously existed.
  Ascent AP power supplies further extend your ability to optimize output by introducing additional control parameters in a compact solution for dual- and now also single-magnetron sputtering. With patented
  pulsing technology, the Ascent AP solution proactively inhibits arcs, and its wide operational range unlocks a range of material options to extend process flexibility and material innovation.

Why AEI?

• Precise sputtering of dielectric and conductive films
• Single-magnetron and dual-magnetron configurations available
• Extended process control, flexibility, and innovation
• High film quality and throughput
• Repeatable, customizable films
• Higher power levels with reduced arc damage
• Easy integration and control

Power Delivery