Industry-leading arc management—stable power delivery through extreme arc conditions, for highly repeatable films
Applications
In 2013, AE® disrupted the dual-magnetron sputtering paradigm by introducing bipolar pulsed-DC technology, providing unprecedented plasma control where only limited control previously existed.
Ascent AP power supplies further extend your ability to optimize output by introducing additional control parameters in a compact solution for dual- and now also single-magnetron sputtering. With patented
pulsing technology, the Ascent AP solution proactively inhibits arcs, and its wide operational range unlocks a range of material options to extend process flexibility and material innovation.
Why AEI?
Precise sputtering of dielectric and conductive films
Single-magnetron and dual-magnetron configurations available
Extended process control, flexibility, and innovation
